Publications
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![Phosphorus diffused LPCVD polysilicon passivated contacts](/assets/components/phpthumbof/cache/PolySilicon_1.9e75d57c5bc42f6f9b22877bd7ea4058.jpg)
Phosphorus diffused LPCVD polysilicon passivated contacts
Jul 06, 2018
|We present a passivated contact technology based on polysilicon deposited using low pressure chemical vapour deposition (LPCVD) over an ultra-thin silicon dioxide layer, which achieves an excellent surface passivation with implied open-circuit voltage of 735 mV, a recombination prefactor below 1 fA cm−2 and contact resistivity below 1 mΩcm2.